Journal
JOURNAL OF DISPLAY TECHNOLOGY
Volume 11, Issue 9, Pages 764-767Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JDT.2015.2438955
Keywords
Solution-processed; zirconium oxide (ZrOx); top gate; thin-film transistors (TFTs)
Funding
- Shanghai Science and Technology Commission [13520500200]
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We report a solution-processed a top gate indium-gallium-zinc oxide thin film transistors (IGZO TFTs) with high-zirconium oxide (ZrOx) dielectric. Both the dielectrics and electrodes were fabricated by spin coating or screen printing. The ZrOx exhibits an amorphous structure and smooth enough to be used as a gate insulator for TFT. The TFT with maximum process temperature of 300 degrees C had a saturation mobility of 0.2 cm(2)/V . s, an on/off ratio of 10, a threshold voltage of 0.3 V, and the subthreshold swing is 0.34 V/decade.
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