Journal
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 10, Issue 11, Pages D121-D123Publisher
ELECTROCHEMICAL SOC INC
DOI: 10.1149/1.2771086
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An anisotropic growth of nanostructures was observed when germanium was electroplated on a patterned silicon substrate from a nonaqueous solution. Instead of an isotropic growth of mushroom cap expected for electroplating through mask, wire-shaped and wall-shaped structures were obtained, respectively, on via and stripe patterns on silicon substrate. The presence of water in the electrolyte and a high current density were found critical to the anisotropic growth. A passivation of outer surface of the deposit is believed to be involved and prohibits the lateral growth of the deposit. (c) 2007 The Electrochemical Society.
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