Journal
APPLIED OPTICS
Volume 47, Issue 16, Pages 2926-2930Publisher
OPTICAL SOC AMER
DOI: 10.1364/AO.47.002926
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Boron films deposited by evaporation with an electron-beam were found to have a relatively high reflectance in the extreme ultraviolet with values similar to those of ion-beam-sputtered (IBS) SiC and IBS B4C. The largest reflectance was measured for an 11 nm thick boron film. Some reflectance degradation was observed for boron films stored in a desiccator. Reflectance degradation varied from sample to sample and was found to be either similar to that of IBS SiC and IBS B4C or larger. (C) 2008 Optical Society of America.
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