Journal
JOURNAL OF ADVANCED DIELECTRICS
Volume 1, Issue 1, Pages 57-61Publisher
WORLD SCIENTIFIC PUBL CO PTE LTD
DOI: 10.1142/S2010135X11000070
Keywords
Thin film; Bi0.5Na0.5TiO3; lead-free; ferroelectric
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Funding
- Glenn Howatt foundation
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We have developed a uniform and dense epitaxial thin film of 0.94(Bi0.5Na0.5)TiO3 - 0.04 x (Bi0.5Na0.5)TiO3 - 0.02BaTiO(3) on a SrRuO3 coated SrTiO3 substrate by pulsed laser deposition method. The remnant polarization, coercive field and dielectric constant of the film with thickness of 315 nm, were measured to be 16.6 mu C center dot cm(-2), 147.5 kV center dot cm(-1) and 640 (at 1 kHz), respectively. The film exhibited a high breakdown voltage and low leakage current of 1.1 x 10(-5) A center dot cm(-2) at 310 kV center dot cm(-1). This (Bi0.5Na0.5)TiO3-based thin film with a target composition in the rhombohedral side of the morphotropic phase boundary can be considered a potential candidate for relatively high power applications.
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