Journal
AIMS MATERIALS SCIENCE
Volume 1, Issue 2, Pages 87-102Publisher
AMER INST MATHEMATICAL SCIENCES-AIMS
DOI: 10.3934/matersci.2014.2.87
Keywords
carbon nanofibers; plasma processing; sputtering; thin film deposition; photoluminescence; silicon nitride
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Funding
- Scientific User Facilities Division, Office of Basic Energy Sciences, U.S. Department of Energy
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The growth of vertically aligned carbon nanofibers (VACNFs) in a catalytic dc ammonia/acetylene plasma process on silicon substrates is often accompanied by sidewall deposition of material that contains predominantly Si and N. In fluorescent microscopy experiments, whereby VACNFs are interfaced to cell and tissue cultures for a variety of applications, it was observed that this material is broadly fluorescent. In this paper, we provide insight into nature of these silicon/nitrogen in-situ coatings. We propose a potential mechanism for deposition of SiNx coating on the sidewalls of VACNFs during PECVD synthesis and explore the origin of the coating's fluorescence. It is most likely that the substrate reacts with process gases similar to reactive sputtering and chemical vapor deposition (CVD), forming silane and other silicon bearing compounds prior to isotropic deposition as a SiNx coating onto the VACNFs. The formation of Si-nanoclusters (NCs) is also implicated due to a combination of strong fluorescence and elemental analysis of the samples. These broadly luminescent fibers can prove useful as registry markers in fluorescent cellular studies and for tagging and tracing applications.
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