Journal
RSC ADVANCES
Volume 5, Issue 128, Pages 106083-106086Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c5ra20289b
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Funding
- Griffith University's New Researcher Grants
- Australian Research Council [LP150100153]
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We report for the first time the thermoresistive property of p-type single crystalline 3C-SiC (p-3C-SiC), which was epitaxially grown on a silicon (Si) wafer, and then transferred to a glass substrate using a Focused Ion Beam (FIB) technique. A negative and relatively large temperature coefficient of resistance (TCR) up to -5500 ppm K-1 was observed. This TCR is attributed to two activation energy thresholds of 45meV and 52 meV, corresponding to temperatures below and above 450 K, respectively, and a small reduction of hole mobility with increasing temperature. The large TCR indicates the suitability of p-3C-SiC for thermal-based sensors working in high-temperature environments.
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