Journal
RSC ADVANCES
Volume 6, Issue 18, Pages 15080-15086Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c5ra25962b
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Funding
- National Natural Science Foundation of China [51372033, 51202022, 61378028]
- National High Technology Research and Development Program of China [2015AA034202]
- 111 Project [B13042]
- Specialized Research Fund for the Doctoral Program of Higher Education [20120185120011]
- Sichuan Youth Science and Technology Innovation Research Team Funding [2011JTD0006]
- Sino-German Cooperation PPP Program of China
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Heteroatom-doping of graphene is of fundamental importance to enable a wide range of optoelectronic and energy storage devices while exploring their basic material properties. Herein, a facile and low-cost method is presented to synthesize the silicon-doped reduced graphene oxide (Si-rGO) via annealing treatment of triphenylsilane and graphene oxide. Compared to the pristine reduced graphene oxide (rGO), Si-rGO exhibits significant enhancement in electrocatalytic and electrochemical properties: when Si-rGO is used as a metal-free electrocatalyst in counter electrodes in dye-sensitized solar cells (DSSCs), the conversion efficiency is increased by 29.6%; when Si-rGO is used as an active electrode in a supercapacitor, the specific capacity is increased by 48.5%. This suggests that silicon doping can effectively improve the electrocatalytic ability and electrochemical performance. It is promising for Si-rGO to be used as a metal-free catalytic and active material.
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