Journal
APPLIED PHYSICS EXPRESS
Volume 10, Issue 6, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.7567/APEX.10.061004
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Funding
- National Natural Science Foundation of China [61504090, 21471111, 61475110, 61404089]
- Applied Basic Research Projects of Shanxi Province [2016021028]
- Shanxi Provincial Key Innovative Research Team in Science and Technology [201605D131045-10]
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The nominal internal quantum efficiency of InGaN/GaN multiple quantum wells significantly increases from 5.6 to 26.8%, as a low-temperature GaN cap layer is grown in N-2/H-2 mixture gas. Meanwhile, the room-temperature photoluminescence (PL) peak energy shows a merely 73 meV blue shift. On the basis of temperature-dependent PL characteristics analysis, the huge improvement in PL efficiency arises mainly from the etching effect of hydrogen, which reduces the defect density and indium segregation at the upper well/barrier interface, and consequently contributes to the decrease in the number of nonradiative recombination centers and the enhancement of carrier localization. (C) 2017 The Japan Society of Applied Physics
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