4.7 Article

Ab initio atomistic thermodynamics study on the oxidation mechanism of binary and ternary alloy surfaces

Journal

JOURNAL OF CHEMICAL PHYSICS
Volume 142, Issue 6, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4907718

Keywords

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Funding

  1. National Natural Science Foundation of China [11104203, 11274277, 51472180, 51132002]
  2. High Technology Research and Development Program of China (863 Program) [2015AA034702]
  3. Tianjin Municipal Natural Science Foundation of China [13JCZDJC33900]
  4. Research Grant Council of the Hong Kong Special Administrative Region, China [CityU 120611(9041679)]
  5. U.S. NSF [0645953]
  6. Directorate For Engineering
  7. Div Of Civil, Mechanical, & Manufact Inn [0645953] Funding Source: National Science Foundation

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Utilizing a combination of ab initio density-functional theory and thermodynamics formalism, we have established the microscopic mechanisms for oxidation of the binary and ternary alloy surfaces and provided a clear explanation for the experimental results of the oxidation. We construct three-dimensional surface phase diagrams (SPDs) for oxygen adsorption on three different Nb-X(110) (X = Ti, Al or Si) binary alloy surfaces. On the basis of the obtained SPDs, we conclude a general microscopic mechanism for the thermodynamic oxidation, that is, under O-rich conditions, a uniform single-phase SPD (type I) and a nonuniform double-phase SPD (type II) correspond to the sustained complete selective oxidation and the non-sustained partial selective oxidation by adding the X element, respectively. Furthermore, by revealing the framework of thermodynamics for the oxidation mechanism of ternary alloys through the comparison of the surface energies of two separated binary alloys, we provide an understanding for the selective oxidation behavior of the Nb ternary alloy surfaces. Using these general microscopic mechanisms, one could predict the oxidation behavior of any binary and multi-component alloy surfaces based on thermodynamics considerations. (C) 2015 AIP Publishing LLC.

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