4.5 Article

Optimization based on sensitivity for material birefringence in projection lens

Journal

CHINESE OPTICS LETTERS
Volume 18, Issue 6, Pages -

Publisher

OSA-OPTICAL SOC
DOI: 10.3788/COL202018.062201

Keywords

birefringence; polarization aberration; projection lens

Categories

Funding

  1. National Science and Technology Major Project [2016ZX02201]
  2. State Key Laboratory of Laser Interaction with Matter [SKLLIM1804]
  3. Jilin Scientific and Technological Development Program [20190302050GX]

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Polarization aberration caused by material birefringence can be partially compensated by lens clocking. In this Letter, we propose a fast and efficient clocking optimization method. First, the material birefringence distribution is fitted by the orientation Zernike polynomials. On this basis, the birefringence sensitivity matrix of each lens element can be calculated. Then we derive the rotation matrix of the orientation Zernike polynomials and establish a mathematical model for clocking optimization. Finally, an optimization example is given to illustrate the efficiency of the new method. The result shows that the maximum RMS of retardation is reduced by 64% using only 48.99 s.

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