Journal
ACS APPLIED MATERIALS & INTERFACES
Volume 14, Issue 5, Pages 7004-7011Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acsami.1c22626
Keywords
hexagonal boron nitride (h-BN); substrate temperature; crystalline quality; doping; photodetectors
Funding
- National Natural Science Foundation of China [61874106, 61904174, 62174009]
- Strategic Priority Research Program of the Chinese Academy of Sciences [XDB43000000]
- Natural Science Foundation of Beijing Municipality [4212045]
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High-quality few-layer h-BN can be directly grown on sapphire substrates at a relatively low temperature of 700 degrees C by introducing NH3 into the growth chamber during ion beam sputtering deposition. Introducing carbon into the h-BN layer by simultaneously introducing CH4 and NH3 during the growth process allows further tailoring of its properties. A deep ultraviolet (DUV) photodetector fabricated from a C-doped h-BN layer shows superior performance compared to an intrinsic h-BN device.
Wide-band-gap layered semiconductor hexagonal boron nitride (h-BN) is attracting intense interest due to its unique optoelectronic properties and versatile applications in deep ultraviolet optoelectronic and two-dimensional electronic devices. However, it is still a great challenge to directly grow high-quality hBN on dielectric substrates, and an extremely high substrate temperature or annealing is usually required. In this work, high-quality few-layer h-BN is directly grown on sapphire substrates via ion beam sputtering deposition at a relatively low temperature of 700 degrees C by introducing NH3 into the growth chamber. Such low growth temperature is attributed to the presence of abundant active N species, originating from the decomposition of NH3 under ion beam irradiation. To further tailor the properties of h-BN, carbon was introduced into the h-BN layer by simultaneously introducing CH4 and NH3 during the growth process, indicating the wide applicability of this approach. Moreover, a deep ultraviolet (DUV) photodetector is also fabricated from a C-doped h-BN layer and exhibits superior performance compared with an intrinsic h-BN device.
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