Journal
JOURNAL OF POROUS MATERIALS
Volume 7, Issue 1-3, Pages 227-231Publisher
KLUWER ACADEMIC PUBL
DOI: 10.1023/A:1009603308141
Keywords
porous silicon; micromachining; localised anodisation; fibre positioning
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Low-loss optical fibre connections require deep grooves etched in silicon substrate for accurate fibre positioning. As shown in this paper these grooves can be obtained by using localised formation of porous silicon on patterned substrates. Cr-Au masking layer with a duration in HF solution longer than 30 min is used to fabricate grooves with a depth higher than 75 mu m. N+-type silicon provides grooves with a pseudo-V shape which is compatible with accurate fibre alignment. By using this technology, arrays of optical fibres are positioned with an accuracy higher than 1 mu m.
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