Journal
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
Volume 39, Issue 2B, Pages 745-751Publisher
JAPAN J APPLIED PHYSICS
DOI: 10.1143/JJAP.39.745
Keywords
nitrogen doping; phase change; Ge2Sb2Te5-(N) thin films; in situ ellipsometry; Johnson-Mehl-Avrami equation; nucleation process; grain growth; crystallization; grain size refinement
Categories
Ask authors/readers for more resources
The crystallization behavior of nitrogen-doped amorphous Ge2Sb2Te5-(N) phase-change thin films was studied by utilizing differential scanning calorimetry, in situ ellipsometry and in situ transmission electron microscopy. The combined analysis of in situ ellipsometry isotherms of amorphous Ge2Sb2Te5-(N) films and the Johnson-Mehl-Avrami equation revealed that the crystallization process of amorphous Ge2Sb2Te5-(N) films changes depending on the nitrogen content. The crystallization behavior of Ge2Sb2Te5 film revealed a two-step process that includes spherical-nucleation and disc-shaped grain growth. In contrast, nitrogen-doping into Ge2Sb2Te5 thin films suppresses the second step and the crystallization of Ge2Sb2Te5-(N) becomes a onestep process that is the primary nucleation process. The number of nucleation sites during the crystallization of amorphous Ge2Sb2Te5-(N) films, increased markedly with the annealing temperature in the spherically shaped nuclei and eventually saturated. The effective crystallinity of Ge2Sb2Te5-(N) alloy films decreased with the increase in nitrogen content, mainly due to the grain-size refinement.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available