Diffusion in the Ti-Al system

Many properties of industrial Ti-Al alloys, such as high-temperature stability of the lamellar structure and creep resistance, are determined by diffusion rates in the phases and along the interfaces. The knowledge of diffusion characteristics and fundamental understanding of diffusion mechanisms are of great importance to the research and design of industrial Ti-Al alloys. This paper gives an overview of recent progress in experimental and theoretical studies of diffusion behavior in the phases of the Ti-Al system. The experimental methods used in modern diffusion measurements are briefly described, and recent experimental results for Ti and Al diffusion in alpha-Ti(AI), beta-Ti(AI), and intermetallic phases alpha(2)-Ti3Al and gamma-TiAl, are summarized. The results for interdiffusion and impurity diffusion in these phases are also discussed in detail. The second part of the paper provides an overview of current understanding of point defects and diffusion mechanisms in Ti3Al and TiAl. A statistical model of point-defect disorder in ordered compounds is presented and applied to Ti3Al and TiAl using input data generated with embedded-atom potentials. Possible atomic mechanisms of diffusion in these compounds are analyzed in detail, and methods of diffusion calculations under different mechanisms are reviewed. The relative importance of different mechanisms in Ti3Al and TiAl is evaluated by comparing their estimated activation energies. Prospective topics of further experimental and theoretical research in this area are outlined. (C) 2000 Acta Metallurgica Inc. Published by Elsevier Science Lin. All rights reserved.