Journal
PHYSICAL REVIEW B
Volume 61, Issue 12, Pages 8233-8237Publisher
AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.61.8233
Keywords
-
Ask authors/readers for more resources
The tight-binding molecular dynamics method with hot electrons is used to simulate the laser-induced melting of silicon. The results are in good agreement with previous ab initio simulation and experimental data. Our findings assess the reliability of the tight-binding model to describe silicon with a high concentration of excited electrons. The role of volume changes in the laser-induced melting has also been addressed within constant-pressure tight-binding molecular dynamics.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available