4.4 Article

Upper limits for the residual aberrations of a high-resolution aberration-corrected STEM

Journal

ULTRAMICROSCOPY
Volume 81, Issue 3-4, Pages 163-175

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/S0304-3991(99)00194-1

Keywords

-

Categories

Ask authors/readers for more resources

The development of correctors for electron optical systems has already brought the improvement of resolution for a low-voltage scanning electron microscope and a commercially available transmission electron microscope and is anticipated in the near future for a dedicated scanning transmission electron microscope (STEM). The resolution attainable especially of a probe-forming system at 200 kV cannot only be estimated from calculations ignoring all non-rotationally symmetric axial aberrations in an electron optical system. For a certain resolution, one would like to attain, the influence of the deviations from the ideal, aberration-free system has to be investigated. Therefore, in the following we have carried out the evaluation of the required accuracy for the compensation of the various residual aberrations in order to achieve a resolution in the sub-Angstrom regime with a probe-forming system. (C) 2000 Published by Elsevier Science B.V. All rights reserved.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.4
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available