Journal
EUROPHYSICS LETTERS
Volume 50, Issue 1, Pages 61-67Publisher
E D P SCIENCES
DOI: 10.1209/epl/i2000-00235-7
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Experimental results on amorphous ZrAlCu thin-film growth and the dynamics of the surface morphology as predicted from a minimal nonlinear stochastic deposition equation are analysed and compared. Key points of this study are: i) an estimation procedure for coefficients entering into the growth equation and ii) a detailed analysis and interpretation of the time evolution of the correlation length and the surface roughness. The results corroborate the usefulness of the deposition equation as a tool for studying amorphous growth processes.
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