Journal
THIN SOLID FILMS
Volume 365, Issue 2, Pages 348-367Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/S0040-6090(99)01056-1
Keywords
plasma etching reactor; plasma modeling; plasma simulation
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As microelectronic devices continue to shrink and process requirements become ever more stringent, plasma modeling and simulation becomes increasingly more attractive as a tool for design, control, and optimization of plasma reactors. A brief introduction and overview of the plasma reactor modeling and simulation problem is presented in this paper. The problem is broken down into smaller pieces (reactor, sheath. microfeature. and crystal lattice) to address the disparity in length scales. A modular approach also helps to resolve the issue of disparity in time scales. (C) 2000 Elsevier Science S.A. All rights reserved.
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