Journal
THIN SOLID FILMS
Volume 366, Issue 1-2, Pages 102-106Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/S0040-6090(99)01111-6
Keywords
dielectrics; laser ablation; oxides; ruthenium
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We prepared RuO2 thin films on Si substrates by pulsed-laser deposition using a sintered oxide target, and investigated the crystallographic nature and the thermodynamic stability of the films in terms of the growth conditions: temperature and oxygen pressure. Faceted grains grew in a highly oxidizing atmosphere. The films grown at room temperature included a large quantity of oxygen ions in the Ru metal matrix. An oriented Ru metal film grew under a non-oxidizing atmosphere. The grain morphology was closely related to the oxygen pressure. (C) 2000 Elsevier Science S.A. All rights reserved.
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