Journal
ANALYTICA CHIMICA ACTA
Volume 860, Issue -, Pages 8-14Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/j.aca.2015.01.011
Keywords
Inductively coupled plasma mass spectrometry; Flow injection; Slurry sampling; Vapor generation; Lotions; Multi-elemental analysis
Categories
Funding
- Ministry of Science and Technology (MOST) of the Republic of China [NSC100-2113-M-110-002-MY3]
- NSUSU-KMU Joint Research Project [NSYSUKMU 103-P008]
Ask authors/readers for more resources
A slurry sampling inductively coupled plasma mass spectrometry (ICP-MS) method has been developed for the determination of Ge, As, Cd, Sb, Hg and Bi in cosmetic lotions using flow injection (FI) vapor generation (VG) as the sample introduction system. A slurry containing 2% m/v lotion, 2% m/v thiourea, 0.05% m/v L-cysteine, 0.5 mu gmL(-1) Co(II), 0.1% m/v Triton X-100 and 1.2% v/v HCl was injected into a VGICP- MS system for the determination of Ge, As, Cd, Sb, Hg and Bi without dissolution and mineralization. Because the sensitivities of the analytes in the slurry and that of aqueous solution were quite different, an isotope dilution method and a standard addition method were used for the determination. This method has been validated by the determination of Ge, As, Cd, Sb, Hg and Bi in GBW09305 Cosmetic (Cream) reference material. The method was also applied for the determination of Ge, As, Cd, Sb, Hg and Bi in three cosmetic lotion samples obtained locally. The analysis results of the reference material agreed with the certified value and/or ETV-ICP-MS results. The detection limit estimated from the standard addition curve was 0.025, 0.1, 0.2, 0.1, 0.15, and 0.03 ng g(-1) for Ge, As, Cd, Sb, Hg and Bi, respectively, in original cosmetic lotion sample. (C) 2015 Elsevier B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available