Nanoscale pattern formation in Pt thin films due to ion-beam-induced dewetting

Atomic force microscopy is used to characterize the evolution of film morphology produced by heavy-ion bombardment. Pt films, 3 and 5 nm thick, are deposited on SiO2 substrates and subsequently bombarded by 800 keV Kr+. Ion doses of > 2x10(14) initiate pattern formation and the dewetting of Pt films from the substrate. The film morphology becomes increasingly disconnected with increasing dose; at the highest doses, (similar to 2x10(16) cm(-2)), isolated nanoparticles are formed with a uniform spacing. The results are explained by the nucleation of bare substrate patches and subsequent coarsening of the morphology by the molten zones created by individual Kr+ impacts. (C) 2000 American Institute of Physics. [S0003-6951(00)02422-0].