Journal
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 33, Issue 11, Pages 1303-1314Publisher
IOP PUBLISHING LTD
DOI: 10.1088/0022-3727/33/11/309
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This work is devoted to the study of atomic oxygen recombination on a glass surface, mainly in connection with atomic sources development. Ln this paper we present a non-stationary model for atomic oxygen recombination on a fused silica surface. Kinetics equations for oxygen atoms, taking into account heterogeneous reactions between gaseous atoms and the surface (Eley-Rideal mechanisms), as well as homogeneous processes involving surface migration of adsorbed species (Langmuir-Hinshelwood mechanisms), are solved. Surface reaction coefficients an calculated, and the choice of numerical values for surface parameters is discussed. The solution to the equations is compared to our previous experiments concerning the influence of the surface state on atomic recombination. An estimation is made of surface reaction coefficient values.
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