Journal
SURFACE SCIENCE
Volume 459, Issue 1-2, Pages 161-172Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/S0039-6028(00)00464-7
Keywords
electron energy loss spectroscopy (EELS); epitaxy; low energy electron diffraction (LEED); nickel oxides; photoelectron diffraction
Categories
Ask authors/readers for more resources
In electron energy loss spectroscopy (EELS) at low primary energies, only a depth of about three to four layers is probed, and EELS spectra of NiO exhibit distinct loss structures, which arise from crystal field transitions at the O-h-coordinated Ni2+ sites in the bulk as well as at the C-4v-coordinated surface sites. Besides the well-known surface state at E=0.6 eV, the loss structures at Delta E similar to 1 eV and Delta E=2.1 eV have been assumed to contain contributions from transitions, which take place at C-4v sites. In order to extract the contributions of these surface states from those of the bulk, EELS spectra were recorded at NiO/Ag(001) films with NiO coverages from the submonolayer range up to thicknesses larger than the probing depth. It was found that in the case of ultrathin NiO films, i.e. if the number of O-h sites was strongly reduced, the only NiO-related loss structures that could be observed besides the plasmon of the Ag(001) substrate were the surface states at Delta E=0.6 eV and Delta E=2.1 eV. In contrast, the surface contributions of the 1.1 eV loss could not be observed, even for very low NiO coverages. (C) 2000 Elsevier Science B.V. All rights reserved.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available