4.4 Article

Surface roughening in electrodeposited nickel films on ITO glasses at a low current density

Journal

SURFACE SCIENCE
Volume 459, Issue 1-2, Pages L462-L466

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/S0039-6028(00)00551-3

Keywords

atomic force microscopy; electrochemical methods; electron-solid diffraction; nickel; surface roughening; surface structure, morphology, roughness, and topography; X-ray scattering, diffraction, and reflection

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We have studied the kinetic surface roughening of nickel films electrodeposited on ITO glasses at a low current density using atomic force microscopy (AFM), electron and X-ray diffraction. The AFM images of the nickel films exhibited the scaling relations represented by the growth exponent beta = 0.78 +/- 0.03 and the roughness exponent alpha = 0.96 +/- 0.04, which is in good agreement with the prediction by the diffusion-driven growth model. Electron and X-ray diffraction revealed a preferred growth orientation of the electrodeposited nickel films, which gives an explanation for the growth exponent beta greater than 1/2. (C) 2000 Elsevier Science B.V. All rights reserved.

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