Journal
THIN SOLID FILMS
Volume 370, Issue 1-2, Pages 151-154Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/S0040-6090(00)00956-1
Keywords
deposition process; infrared spectroscopy; optical properties; silicon carbide
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Thin films of silicon carbide nitride (SiCN) have been prepared by reactive radioactive frequency (r.f.) sputtering using SiC target and nitrogen as the reactant gas. Deposition rates are studied as a function of deposition pressures and argon-nitrogen flow ratios. The optical absorption studies indicated the band edge shifting of the films when the nitrogen ratios are increased during deposition. Fourier transform infrared spectroscopy (FTIR) analysis on the films indicated several stretching modes corresponding to SiC, SiN and CN compositions. (C) 2000 Elsevier Science S.A. All rights reserved.
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