Journal
APPLIED PHYSICS LETTERS
Volume 77, Issue 20, Pages 3233-3235Publisher
AMER INST PHYSICS
DOI: 10.1063/1.1325394
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The density of threading dislocations (TD) in GaN grown directly on flat sapphire substrates is typically greater than 10(9)/cm(2). The density of dislocations can be decreased by orders of magnitude using cantilever epitaxy, which employs pre-patterned sapphire substrates to provide reduced-dimension mesa regions for nucleation and etched trenches between them for suspended lateral growth of GaN or AlGaN. The substrate is pre-patterned with narrow lines and etched to a depth that permits coalescence of laterally growing III-N nucleated on the mesa surfaces before vertical growth fills the etched trench. Low-dislocation densities typical of epitaxial lateral overgrowth are obtained in the cantilever regions and the TD density is also reduced up to 1 mum from the edge of the support regions. (C) 2000 American Institute of Physics. [S0003-6951(00)02846-1].
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