4.6 Article

Nanoindentation of epitaxial GaN films

Journal

APPLIED PHYSICS LETTERS
Volume 77, Issue 21, Pages 3373-3375

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.1328047

Keywords

-

Ask authors/readers for more resources

Wurtzite GaN films grown on sapphire substrates are studied by nanoindentation with a spherical indenter. No systematic dependence of the mechanical properties of GaN epilayers on the film thickness (at least for thicknesses from 1.8 to 4 mum) as well as on doping type is observed. Slip is identified as one of the physical mechanisms responsible for plastic deformation of GaN and may also contribute to the pop-in events observed during loading. No visible material cracking is found even after indentations at high loads (900 mN), but a pronounced elevation of the material surrounding the impression is observed. (C) 2000 American Institute of Physics. [S0003-6951(00)04447-8].

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available