Journal
THIN SOLID FILMS
Volume 381, Issue 1, Pages 6-9Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/S0040-6090(00)01415-2
Keywords
carbon nitride; corrosion; pulsed bias; ultrathin films
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Ultrathin films of carbon nitride were grown using d.c. magnetron sputtering in a single cathode deposition system. A high frequency pulsed bias was applied to both the target and the substrate during deposition to help sustain a stable plasma and enhance ion bombardment of the growing film. These films exhibit excellent corrosion resistance at film thickness down to 1 nm. Atomic force microscopy measurements reveal an atomically smooth surface. The role of pulsed bias and bombardment by ionized species in obtaining low defect-density coatings is discussed. (C) 2001 Elsevier Science B.V. All rights reserved.
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