Journal
APPLIED PHYSICS LETTERS
Volume 78, Issue 13, Pages 1850-1852Publisher
AMER INST PHYSICS
DOI: 10.1063/1.1358846
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We increased the absorptance of light by silicon to approximately 90% from the near ultraviolet (0.25 mum) to the near infrared (2.5 mum) by surface microstructuring using laser-chemical etching. The remarkable absorptance most likely comes from a high density of impurities and structural defects in the silicon lattice, enhanced by surface texturing. Microstructured avalanche photodiodes show significant enhancement of below-band-gap photocurrent generation at 1.06 and 1.31 mum, indicating promise for use in infrared photodetectors. (C) 2001 American Institute of Physics.
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