Journal
MATERIALS SCIENCE & ENGINEERING R-REPORTS
Volume 32, Issue 6, Pages 191-236Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/S0927-796X(00)00032-2
Keywords
ferroelectric films; heterostructures; sputter-deposition; laser ablation-deposition; metalorganic chemical vapor-deposition; microstructure; properties; non-volatile ferroelectric memories
Ask authors/readers for more resources
We present in this article a review of the status of thin film ferroelectric materials for nonvolatile memories. Key materials issues relevant to the integration of these materials on Si wafers are discussed. The effect of film microstructure and electrode defect chemistry on the ferroelectric properties relevant to a high density nonvolatile memory technology are discussed. The second part of this review focuses on approaches to integrate these capacitor structures on a filled poly-Si plug which is a critical requirement for a high density memory technology. Finally, the use of novel surface probes to study and understand broadband polarization dynamics in ferroelectric thin films is also presented. (C) 2001 Published by Elsevier Science B.V.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available