Journal
SENSORS AND ACTUATORS A-PHYSICAL
Volume 90, Issue 3, Pages 223-231Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/S0924-4247(01)00531-3
Keywords
etching; surface roughness; single-crystal silicon; TMAH
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We investigated the surface roughness properties of single-crystal silicon etched by a TMAH water solution. We used a hemispherical specimen, in which all crystallographic orientation planes appeared on the surface, and made a map of the surface roughness distribution pattern. The surface roughening and morphology strongly depends on crystallographic orientation. Different types of facet structures appeared at different orientations. The (1 0 0) orientation had the smoothest etched surface. We further studied roughening characteristics, such as dependence on the etching time and TMAH concentration, for the (1 0 0), (1 1 0), and (1 1 1) planes. The roughness values of these three planes depend on the etching time. The values for the (1 0 0) and (1 1 l)planes became saturated as the etching time increased at high TMAH concentration. The roughness of the (1 1 1) surface did not depend on the TMAH concentration, (C) 2001 Elsevier Science B.V. All rights reserved.
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