Journal
APPLIED PHYSICS LETTERS
Volume 78, Issue 21, Pages 3322-3324Publisher
AMER INST PHYSICS
DOI: 10.1063/1.1375006
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We demonstrated that nanoimprint lithography (NIL) can create three-dimensional patterns, sub-40 nm T-gates, and air-bridge structures, in a single step imprint in polymer and metal by lift-off. A method based on electron beam lithography and reactive ion etching was developed to fabricate NIL molds with three-dimensional protrusions. The low-cost and high-throughput nanoimprint lithography for three-dimensional nanostructures has many significant applications such as monolithic microwave integrated circuits and nanoelectromechanical system. (C) 2001 American Institute of Physics.
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