Journal
SURFACE SCIENCE
Volume 482, Issue -, Pages 687-692Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/S0039-6028(01)00926-8
Keywords
electron microscopy; photoelectron emission; lead; alloys; silicon
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Multi-photon excitations from thin metallic films on silicon substrates have been observed utilising photoemission electron microscopy. The photoelectrons have been excited by means of high power femtosecond laser pulses with a photon energy below the work function threshold. The strong spatial variations of the non-linear effects became directly visible in electron emission from the adsorbed thin films. Centres of enhanced photoelectron yield. so-called hot spots, were observed on the surfaces of various samples. The multi-photon electron yield of the metallic films (permalloy and lead) depends strongly on the sample topography and the photon polarisation. (C) 2001 Elsevier Science B.V. All rights reserved.
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