Journal
PHYSICS OF PLASMAS
Volume 8, Issue 7, Pages 3490-3497Publisher
AIP Publishing
DOI: 10.1063/1.1375149
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Charging and trapping of macroparticles in the near-electrode region of fluorocarbon etching plasmas with negative ions is considered. The equilibrium charge and forces on particles are computed as a function of the local position in the plasma presheath and sheath. The ionic composition of the plasma corresponds to the etching experiments in 2.45 GHz surface-wave sustained and 13.56 MHz inductively coupled C4F8+Ar plasmas. It is shown that despite negligible negative ion currents collected by the particles, the negative fluorine ions affect the charging and trapping of particulates through modification of the sheath/presheath structure. (C) 2001 American Institute of Physics.
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