4.0 Article

A superfilling model that predicts bump formation

Journal

ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 4, Issue 7, Pages C50-C53

Publisher

ELECTROCHEMICAL SOC INC
DOI: 10.1149/1.1375856

Keywords

-

Ask authors/readers for more resources

Numerical simulations of a superfilling model are shown to be consistent with experimental results obtained in the absence of an inhibiting, leveling agent that can be described by a diffusion-adsorption mechanism. The model, which assumes that superfilling is caused by accumulation of the adsorbed accelerator at the feature bottom as surface area available for deposition within a feature shrinks, also predicts the formation of bumps. Because the model parameters have not been independently measured, the details of the model may need further refinement, but the general approach appears feasible. (C) 2001 The Electrochemical Society.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.0
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available