Deep X-ray lithography beamline at ELETTRA

A Deep X-Ray Lithography (DXRL) beamline was just commissioned at ELETTRA in Trieste, the Italian third generation synchrotron light source whose features make it well adapted to the DXRL process. A general description of the beamline is given with an emphasis on the reduction of the effect of secondary emission using a high energy filter based on an horizontal beam-stop. Finally the first fabricated microstructures are presented. (C) 2001 Elsevier Science B.V. All rights reserved.