Journal
ACTA MATERIALIA
Volume 49, Issue 13, Pages 2481-2489Publisher
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/S1359-6454(01)00146-X
Keywords
intermetallic; interface; X-ray diffraction (XRD); crystal orientation
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The formation and growth of Cu-Sn intermetallic film at the interface between molten Sn-Pb solders and Cu were studied at different temperature and exposure times. The eta -phase (CU6Sn5) was observed to form at all conditions except at the lowest Sn level of 27 wt% and at the two highest temperatures of 290 and 310 degreesC. The epsilon -phase (Cu3Sn) was then obtained. At high Sn contents and short times, a cellular film with a rugged interface was obtained which evolved into a compact film with a scalloped interface as the Sn content decreased and exposure time increased. The epsilon -phase film always formed with a relatively planar interface. The intermetallic grains showed preferred crystallographic orientations. Thickness measurements showed that the net growth rate depends not only on diffusion through the film but also on the film dissolution. Precipitation of the eta -phase whiskers was detected during cooling, particularly when the temperature was significantly high. (C) 2001 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.
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