A capacitively coupled microplasma (CCμP) formed in a channel in a quartz wafer

An optical emission plasma source with dimensions as small as 0.25 x 0.25 x 5 mm has been implemented on a quartz wafer. The He plasma, formed using a parallel plate, capacitively coupled geometry, operates at atmospheric pressure, uses a 13.56 MHz power source at 5-25 W, with gas flows between 17-150 mL min (1), and is self-igniting. Parallel-plate capacitive power coupling is nearly ideal for generating and sustaining a plasma discharge on a chip since it can be implemented using a very simple electrode structure and does not require tuned or resonant structures.