Journal
JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY
Volume 16, Issue 9, Pages 919-921Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/b103507j
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An optical emission plasma source with dimensions as small as 0.25 x 0.25 x 5 mm has been implemented on a quartz wafer. The He plasma, formed using a parallel plate, capacitively coupled geometry, operates at atmospheric pressure, uses a 13.56 MHz power source at 5-25 W, with gas flows between 17-150 mL min (1), and is self-igniting. Parallel-plate capacitive power coupling is nearly ideal for generating and sustaining a plasma discharge on a chip since it can be implemented using a very simple electrode structure and does not require tuned or resonant structures.
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