Journal
IEE PROCEEDINGS-SCIENCE MEASUREMENT AND TECHNOLOGY
Volume 148, Issue 5, Pages 225-228Publisher
IEE-INST ELEC ENG
DOI: 10.1049/ip-smt:20010395
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The authors have developed two distinct processes for the fabrication of mesoscopic Josephson junction qubits that are compatible with conventional CMOS processing. These devices, based on superconducting Al/Al2O3/Al tunnel junctions, are fabricated by electron beam lithography using single-layer and multi-layer resists. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer shadow masks. It is simpler and more accurate to implement, and avoids the significant areas of redundant metallisation that are an unavoidable by-product of the tri-layer shadow mask method.
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