Journal
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
Volume 235, Issue 1-3, Pages 223-226Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/S0304-8853(01)00342-0
Keywords
dry etching; reactive ion etching; metal-carbonyls
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Remarkable chemical enhancement in etch rate of La-manganite thin film is obtained in CO/NH3 reactive ion etching. The etch rate of 70 nm/min and the selectivity of 4.7 for LSMO thin films over Ti mask are achieved. The edge morphology of the patterned La-manganite becomes significantly smooth compared with pure Ar ion milling. A possible plasma chemistry is also proposed. (C) 2001 Elsevier Science B.V. All rights reserved.
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