Journal
PHYSICAL REVIEW B
Volume 64, Issue 24, Pages -Publisher
AMER PHYSICAL SOC
DOI: 10.1103/PhysRevB.64.245411
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Hydrogen atoms buried at the interface between Pb layers and the Si(111) surface were investigated by resonant nuclear reaction analysis (NRA) using H-1(N-15,alphagamma)C-12 in grazing incidence geometry. Pb atoms were deposited on the H-terminated Si(111) surface at 110 K, and the H depth was clearly distinguished with a depth scale of one monolayer. The NRA spectrum revealed a monotonous shift to higher energy with increasing Pb coverage indicating H remains at the interface between Pb and the Si substrate. The dependence of the spectral shift on the Pb coverage was found to have an offset corresponding to a depth of about 0.1 nm. This offset suggests a model for the Pb/H/Si(111) interface structure implying that the initial Pb layer resides in the preadsorbed H layer.
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