4.7 Article

The origin of haze in CVD tin oxide thin films

Journal

APPLIED SURFACE SCIENCE
Volume 185, Issue 3-4, Pages 161-171

Publisher

ELSEVIER SCIENCE BV
DOI: 10.1016/S0169-4332(01)00554-2

Keywords

tin oxide thin films; haze; internal defects; rugosity; polishing; AFM

Ask authors/readers for more resources

The origin of haze was investigated in antimony-doped tin oxide thin films, and in double-stack thin films of fluorine-doped tin oxide/antimony-doped tin oxide, both deposited by chemical vapor deposition onto soda-lime-silica float glass substrates. These transparent conductive oxide thin films are of great importance in the production of solar control architectural glazing units. Therefore, understanding the origins of haze is necessary to the development of coated, IR-reflecting glass windows with low overall haze levels. Haze measurements of as-prepared and polished samples were correlated with surface roughness and concentration of internal hole defects. Surface roughnesses were evaluated by atomic force microscopy, and characterized by estimated RMS values. In thin tin oxide films (<2000 Angstrom) internal hole defects caused haze, while in thick tin oxide films (>4000 Angstrom) surface roughness was the primary source of haze. (C) 2002 Elsevier Science B.V. All rights reserved.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.7
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available