Journal
JOURNAL OF CRYSTAL GROWTH
Volume 240, Issue 1-2, Pages 14-21Publisher
ELSEVIER
DOI: 10.1016/S0022-0248(01)02389-2
Keywords
atomic force microscopy; substrates; surfaces; metalorganic chemical vapor deposition
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GaN single crystals are used as substrates for homo-epitaxial growth by MOCVD. Prior to growth, the N-face, or (000 1) plane, of the substrate crystals is polished to obtain off-angle orientations of 0, 2, and 4- towards the [1 1 (2) over bar 0] direction. The hillock density of the homo-epitaxial films grown on the misoriented substrates is decreased as compared with the layers grown on the exact N-face. However, in addition to the hillocks, triangular-shaped pits are formed on the films grown on the misoriented substrates. The formation of the triangular-shaped pits is described by the blocking of the anisotropic step-flow growth. (C) 2002 Elsevier Science B.V. All rights reserved.
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