Journal
CHEMISTRY OF MATERIALS
Volume 14, Issue 6, Pages 2476-2485Publisher
AMER CHEMICAL SOC
DOI: 10.1021/cm010776e
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Liquid-phase deposition (LPD) from aqueous solution, under mild conditions of temperature (less than or equal to55 degreesC) and PH (2.88-3.88), can produce thin (0.1-1.0 mum), adherent titania (TiO2) films. This paper reports a systematic study of LPD TiO2 films on variously prepared silicon wafer substrates, including (to our knowledge for the first time with LPD) several types of sulfonated surfaces (including sulfonated self-assembled monolayers and sulfonated polyelectrolyte multilayers). The growth rate and crystallinity of these films could be controlled by careful manipulation of solution parameters and surface functionality of the substrate.
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