4.7 Article

Microstructure and shape memory behavior of Ti51.2(Pd27.0Ni21.8) and Ti49.5(Pd28.5Ni22.0) thin films

Publisher

ELSEVIER SCIENCE SA
DOI: 10.1016/S0921-5093(01)01714-2

Keywords

Ti-Pd-Ni; high-temperature shape memory effect; thin films; sputtering; titanium-rich; precipitation

Ask authors/readers for more resources

The shape memory characteristics of Ti-rich Ti(Pd,Ni) thin films annealed from the amorphous state has been clarified based on the microstructural observations compared with those of the near-equiatmic ones. The films with the compositions of Ti-51.2(Pd27.0Ni21.8) and Ti-49.5(Pd28.5Ni22.0) were crystallized at 773, 873 and 973 K for 1 h. The low- temperature crystallizations at < 973 K from the amorphous state are effective for grain refinement without an additional element or thermo-mechanical treatment. The Ti-51.2(Pd27.0Ni21.8) film annealed at 773 K shows fine plate-like Ti2Pd-type precipitates with a diameter < 100 mm inside the B2 grain, These precipitates have the habit plane parallel to a 1001 plane of the B2 matrix and with the orientation relationship of {100}(B2)parallel to{100}(t12Pd) and <010>(B2)parallel to<011>(Ti2Pd). It was found that the shape memory characteristics could be improved by the precipitation hardening of the Ti2Pd-type precipitates. probably because of the internal strain field produced along the {001} planes of the precipitates. The film shows the Ms temperature of 485 K, the recoverable strain of 2.53% and the residual strain of 0.14% under the constant stress of 440 MPa. (C) 2002 Elsevier Science B.V. All rights reserved.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.7
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available