Optimization of the ΔE effect in thin films and multilayers by magnetic field annealing

The DeltaE effect of amorphous (Fe90Co10)(78)Si12B10 and Tb40Fe60 thin films as well as of Tb40Fe60/Fe50Co50 multilayers deposited on Si substrates using magnetron sputtering has been investigated. Influences of sputtering parameters and especially annealing conditions on the DeltaE effect are discussed. In a field-annealed amorphous (Fe90Co10)(78)Si12B10 thin film, the DeltaE effect is about 30%, assuming the Young's modulus of the film as 150 GPa. It was found that in case of thin-film substrate compounds, the magnetostrictive susceptibility is the determining factor of the size and field dependence of the DeltaE effect.