Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
Volume 20, Issue 6, Pages 2753-2757Publisher
A V S AMER INST PHYSICS
DOI: 10.1116/1.1521744
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We describe a technique to fabricate Bragg gratings in the sides of optical waveguides using a single lithographic step. This technique is particularly suited to the apodized gratings required for add/drop filters in dense-wavelength-division multiplexing. Apodization minimizes cross talk between channels and improves the filter response. Silicon-on-insulator rib waveguides with both uniform and apodized gratings were fabricated using direct-write spatial-phase-locked electron-beam lithography (SPLEBL). This approach combines SPLEBL's pattern-placement accuracy with the flexibility of direct-write device prototyping. The resulting grating-based devices exhibited substantially reduced side-lobe levels. (C) 2002 American Vacuum Society.
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