Journal
CHEMISTRY OF MATERIALS
Volume 14, Issue 11, Pages 4566-4571Publisher
AMER CHEMICAL SOC
DOI: 10.1021/cm011600f
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Repetitive bursts of continuous wave plasma polymerization on the minute time scale are found to lead to the deposition of well-defined polymeric nanospheres. This unique mode of film growth is attributed to a high level of monomer replenishment in combination with minimal secondary reaction processes (e.g., fragmentation, cross-linking, and etching). In the case of the 1H,1H,2H,2H-perfluorooctyl acrylate precursor, high contact angle (superhydrophobic) surfaces are produced by this method.
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