Journal
SOLID STATE IONICS
Volume 152, Issue -, Pages 181-188Publisher
ELSEVIER SCIENCE BV
DOI: 10.1016/S0167-2738(02)00298-9
Keywords
thin film; LiCoO2; intercalation; preferential orientation
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Submicron films of LiCoO2 have been deposited on silicon and stainless steel substrates using RF sputtering and pulsed laser deposition (PLD). Both films show preferred orientation. RF films have their Li diffusion plane oriented favourably, that is, perpendicular to the surface, while PLD films show a parallel, c-axis orientation. Electrochemical experiments indicate a strong dependence of the intercalation rate on the alignment of the host structure toward the electrolyte solution. Lithographic patterning enhances the inferior intercalation properties of the PLD film on silicon, as does the utilisation of stainless steel substrates. (C) 2002 Elsevier Science B.V. All rights reserved.
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