Structure and magnetic properties of electrodeposited Ni films on n-GaAs(001)

We report the structural and magnetic properties of Ni films grown on GaAs(001) using electrodeposition, covering the thickness range 0-80 nm. The structure is characterized by mixed (001) and (011) epitaxial orientation of fee Ni with a preference for the Ni(001) orientation. The magnetic anisotropy is originated by a combination of a crystalline contribution with fourfold symmetry and a uniaxial anisotropy probably caused by the asymmetry in the substrate surface structure. The saturation magnetic moment varies linearly with thickness, indicating limited intermixing between Ni film and GaAs substrate, This is ascribed to the low-energy deposition process characteristic of electrodeposition.